VDF Series Vacuum Degassing Furnace VDF200/500
It is mainly used for device degassing, material degassing, and packaging process degassing.
1. High vacuum, the vacuum degree of the highly equipped vacuum degassing furnace is as high as 10-7pa.
2. Clean environment: high-purity quartz glass is used in the liner of the equipment to ensure that no foreign matter is generated during the degassing process.
3. Easy to use. During the degassing process, the vacuum environment and temperature environment have real-time curve display. Easy to check.
4. The equipment has a data collection function, and can send relevant process parameters, alarm information, and operation records to the management system through the network.
Standard
1. One host of vacuum degassing furnace;
2. One chiller.
3. A set of vacuum dry pump+ molecular pump pumping set.
Optional
Ion pump pumping set
Technical Parameter:
| Model No. | VDF200 | VDF500 |
| Chamber size | Φ200mm*250mm | Φ500mm*500mm |
| Door opening mode | Front door, external switch | |
| Leakage rate | <E-11Pa.M³/S | |
| System pumping speed | 0.1MPa-5E-5Pa Time≤1H | |
| Heating temperature | RT+20℃~+600℃ | |
| Control acuuracy | ≤±0.5℃ | |
| Pressure range | No load cold vacuum (room temperature)≤E-7pa | |
| Heating rate | Heating time from room temperature to 600℃≤40min | |
| Cooling rate | Cooling time from 600℃ to room temperature ≤1h | |
| Cooling system | With water cooler, program control | |
| Temperature uniformity | It is ±3℃ at 150℃ and ±5℃ at 450℃ | |
| Voltage/Power | 220V 50Hz;380v 50Hz/40KW | |
| Size | 680*1100*1550 (Main structure) | 980*1100*1800 (Main structure) |
